A Study of Ion Implantation in Semiconductors

Bibliographic Details
Main Author:	Thomas, C. R.
Published:	University of Oxford 1975
Subjects:	537.622
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.474949

id	ndltd-bl.uk-oai-ethos.bl.uk-474949
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-4749492017-12-24T15:57:34ZA Study of Ion Implantation in SemiconductorsThomas, C. R.1975537.622University of Oxfordhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.474949Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	537.622
spellingShingle	537.622 Thomas, C. R. A Study of Ion Implantation in Semiconductors
author	Thomas, C. R.
author_facet	Thomas, C. R.
author_sort	Thomas, C. R.
title	A Study of Ion Implantation in Semiconductors
title_short	A Study of Ion Implantation in Semiconductors
title_full	A Study of Ion Implantation in Semiconductors
title_fullStr	A Study of Ion Implantation in Semiconductors
title_full_unstemmed	A Study of Ion Implantation in Semiconductors
title_sort	study of ion implantation in semiconductors
publisher	University of Oxford
publishDate	1975
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.474949
work_keys_str_mv	AT thomascr astudyofionimplantationinsemiconductors AT thomascr studyofionimplantationinsemiconductors
_version_	1718572379866660864

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