Tetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energy

Bibliographic Details
Main Author:	Rahman, Md. Anisur
Published:	University of Ulster 2010
Subjects:	621.3
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.520545

id	ndltd-bl.uk-oai-ethos.bl.uk-520545
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-5205452015-03-20T05:35:42ZTetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energyRahman, Md. Anisur2010621.3University of Ulsterhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.520545Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	621.3
spellingShingle	621.3 Rahman, Md. Anisur Tetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energy
author	Rahman, Md. Anisur
author_facet	Rahman, Md. Anisur
author_sort	Rahman, Md. Anisur
title	Tetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energy
title_short	Tetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energy
title_full	Tetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energy
title_fullStr	Tetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energy
title_full_unstemmed	Tetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energy
title_sort	tetrahedral amorphous carbon (ta-c, ta-c:n) and hydrogenated amorphous carbon (a-c:h) thin films : studies of deposition, residual stress and surface energy
publisher	University of Ulster
publishDate	2010
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.520545
work_keys_str_mv	AT rahmanmdanisur tetrahedralamorphouscarbontactacnandhydrogenatedamorphouscarbonachthinfilmsstudiesofdepositionresidualstressandsurfaceenergy
_version_	1716792939582062592

Tetrahedral amorphous carbon (ta-C, ta-C:N) and hydrogenated amorphous carbon (a-C:H) thin films : Studies of deposition, residual stress and surface energy

Similar Items