Interfaces and defects of high-K oxides
Main Author: | Xiong, Ka |
---|---|
Published: |
University of Cambridge
2006
|
Subjects: | |
Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.614372 |
Similar Items
-
First principle modelling of high-K oxide on Ge
by: Li, Huanglong
Published: (2014) -
High-K gate oxides for future complementary metal-oxide-semiconductor transistors
by: Liu, Dameng
Published: (2009) -
High-K metal oxides as a transistor gate insulator
by: Peacock, Paul William
Published: (2004) -
Modelling of high-K gate oxides on GaAs and Ge based high mobility MOSFETs
by: Lin, Liang
Published: (2011) -
High-K gate oxides and metal gate materials for future complementary metal-oxide-semiconductor field-effect transistors
by: Tse, Koon-Yiu
Published: (2008)