Micropattern transfer without photolithography of substrate : Ni electrodeposition using enface technology
Since the standard photolithographic patterning technology possesses a number of sustainable issues, a “maskless” technology, Enface, has been proposed. Here, a patterned ‘tool’ placed opposite to the substrate within micrometre range is required. Etching or plating occurs by passing tailored curren...
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University of Newcastle upon Tyne
2013
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.618169 |