| Summary: | This thesis presents several theoretical investigations into electron scattering with complex molecular systems from interstellar and atmospheric systems to systems for application in industrial plasma etching of silicon surfaces. Through these investigations new methods for calculating dissociation branching ratios for several electron scattering processes, viz. electron impact-dissociative ionisation, -neutral dissociation and -dissociative attachment, are developed and tested. This thesis also presents computational schemes for calculation of high energy electron molecule scattering cross sections. This research links the disciplines of data creation via theoretical investigation and data usage when modelling systems.
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