Structural and field emission properties of ion beam synthesized metal-dielectric nano-composite thin films.

• Other Authors: Yuen, Ying Kit.
• Format: Others
• Language: English; Chinese
• Published: 2007
• Subjects: Thin films; Nanostructured materials; Dielectrics; Ion implantation
• Online Access: http://library.cuhk.edu.hk/record=b5896764; http://repository.lib.cuhk.edu.hk/en/item/cuhk-326152

Yuen, Ying Kit. === Thesis (M.Phil.)--Chinese University of Hong Kong, 2007. === Includes bibliographical references (leaves 90-96). === Abstracts in English and Chinese. === Chapter Chapter 1 --- Introduction === Chapter 1.1 --- Introduction to Electron Field Emission --- p.1 === Chapter 1.2 --- Theory of Electron Field Emission --- p.4 === Chapter 1.3 --- Fowler Nordheim Model for Electron Field Emission in Metals --- p.5 === Chapter 1.4 --- Factors Affecting the Field Emission Properties --- p.7 === Chapter 1.4.1 --- Surface Morphology --- p.7 === Chapter 1.4.2 --- Electrical Inhomogeneity --- p.7 === Chapter 1.5 --- Goal of this Project --- p.9 === Chapter Chapter 2 --- Sample Preparation and Characterization Methods === Chapter 2.1 --- Sample Preparation --- p.11 === Chapter 2.1.1 --- MEVVA Ion Implantation System --- p.13 === Chapter 2.1.2 --- TRIM Simulation --- p.17 === Chapter 2.1.3 --- Implantation Conditions --- p.19 === Chapter 2.2 --- Characterization Methods --- p.21 === Chapter 2.2.1 --- AFM - Atomic Force Microscopy --- p.21 === Chapter 2.2.2 --- C-AFM ´ؤ Conducting Atomic Force Microscopy --- p.23 === Chapter 2.2.3 --- RBS - Rutherford Backscattering Spectrometry --- p.23 === Chapter 2.2.4 --- TEM - Transmission Electron Microscopy --- p.26 === Chapter 2.2.5 --- Field Emission Measurement --- p.27 === Chapter Chapter 3 --- Field Emission Properties of Co-Si02 === Chapter 3.1 --- Introduction --- p.29 === Chapter 3.2 --- RBS results --- p.30 === Chapter 3.3 --- Experimental results of as-implanted Co-SiO2 samples --- p.32 === Chapter 3.3.1 --- AFM and results --- p.32 === Chapter 3.3.2 --- Field emission properties of as-implanted Co-Si02 --- p.35 === Chapter 3.4 --- Step-like and jump-like features in the J-E plots --- p.39 === Chapter 3.5 --- Chapter Summary --- p.43 === Chapter Chapter 4 --- Field Emission Properties of Fe-SiO2 === Chapter 4.1 --- Introduction --- p.45 === Chapter 4.2 --- RBS results --- p.46 === Chapter 4.3 --- Experimental results of as-implanted Fe-SiO2 samples --- p.48 === Chapter 4.3.1 --- AFM and results --- p.48 === Chapter 4.3.2 --- Field emission properties of as-implanted Fe-SiO2 --- p.51 === Chapter 4.3.3 --- Comparison with as-implanted Co-SiO2 --- p.54 === Chapter 4.4 --- Experimental results of annealed Fe-SiO2 samples --- p.57 === Chapter 4.4.1 --- Annealing conditions --- p.57 === Chapter 4.4.2 --- AFM and C-AFM results --- p.57 === Chapter 4.4.3 --- TEM Images --- p.62 === Chapter 4.4.4 --- Field emission properties of annealed Fe-SiO2 --- p.68 === Chapter 4.5 --- Step-like and jump-like features in the J-E plots --- p.81 === Chapter 4.6 --- Field Emission Images --- p.84 === Chapter 4.7 --- Chapter Summary --- p.85 === Chapter Chapter 5 --- Conclusion & Future Plan --- p.87 === Reference --- p.90 === Appendix === Chapter A. --- Derivation of the Fowler Nordheim Equation --- p.97