Nanowire Alignment and Patterning via Evaporation-Induced Directed Assembly
The post synthetic assembly of nanowires into desired configurations presents a unique challenge. The inherent size of nanowires does not lend it self to a method or process capable of easily arranging or manipulating these materials. The recent understanding of how contact-line deposition, or the &...
| Other Authors: | |
|---|---|
| Format: | Others |
| Language: | English English |
| Published: |
Florida State University
|
| Subjects: | |
| Online Access: | http://purl.flvc.org/fsu/fd/FSU_migr_etd-4679 |
| Summary: | The post synthetic assembly of nanowires into desired configurations presents a unique challenge. The inherent size of nanowires does not lend it self to a method or process capable of easily arranging or manipulating these materials. The recent understanding of how contact-line deposition, or the "coffee-ring effect", influences isotropic particles has lead to interest in investigating its influence over nanowires. Research has shown that nanowires can be aligned and selectively deposited at the edge of a drying droplet as a result of evaporation-induced capillary flow. From this basic understanding several methods have developed with the intent of producing a facile, robust, and scalable nanowire assembly process. This work provides insight into the coffee-ring effect and the mechanisms that draw from it to align, assemble, and pattern nanowire structures prior to introducing and providing the results of a new contact line deposition method. === A Thesis submitted to the Department of Industrial and Manufacturing Engineering in partial fulfillment of the requirements for the degree of Master of
Science. === Fall Semester, 2011. === November 2, 2011. === Alignment, Evaporation-Induced, Nanowires, Patterning, Printing, Self-Assembly === Includes bibliographical references. === Mei Zhang, Professor Directing Thesis; Okenwa Okoli, Committee Member; Zhiyong Richard Liang, Committee Member. |
|---|