A study on the composition and deposition mechanism of boron-silicon alloy films using ICP-AES, EDX and FT-IR techniques
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| Format: | Others |
| Language: | English |
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HKBU Institutional Repository
1991
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| Online Access: | https://repository.hkbu.edu.hk/etd_ra/4 https://repository.hkbu.edu.hk/cgi/viewcontent.cgi?article=1003&context=etd_ra |
| Description not available. |