Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas

Kyoto University (京都大学) === 0048 === 新制・課程博士 === 博士(工学) === 甲第17064号 === 工博第3613号 === 新制||工||1548(附属図書館) === 29784 === 京都大学大学院工学研究科航空宇宙工学専攻 === (主査)教授斧髙一, 教授稲室隆二, 教授青木一生 === 学位規則第4条第1項該当...

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Main Author:	Fukumoto, Hiroshi
Other Authors:	斧, 髙一
Format:	Others
Language:	English
Published:	京都大学 (Kyoto University) 2012
Subjects:	Fluorocarbon plasmas Inductively coupled plasma Plasma etching profile Charging 500
Online Access:	http://hdl.handle.net/2433/158076

id	ndltd-kyoto-u.ac.jp-oai-repository.kulib.kyoto-u.ac.jp-2433-158076
record_format	oai_dc
spelling	ndltd-kyoto-u.ac.jp-oai-repository.kulib.kyoto-u.ac.jp-2433-1580762017-10-06T03:48:22Z Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas フルオロカーボンプラズマによる酸化シリコンエッチングにおけるプラズマ－表面相互作用の数値解析 Fukumoto, Hiroshi 斧, 髙一稲室, 隆二青木, 一生福本, 浩志フクモト, ヒロシ Fluorocarbon plasmas Inductively coupled plasma Plasma etching profile Charging 500 Kyoto University (京都大学) 0048 新制・課程博士博士(工学) 甲第17064号工博第3613号新制\|\|工\|\|1548(附属図書館) 29784 京都大学大学院工学研究科航空宇宙工学専攻 (主査)教授斧髙一, 教授稲室隆二, 教授青木一生学位規則第4条第1項該当 2012-07-09T04:32:12Z 2012-07-09T04:32:12Z 2012-05-23 2012-05-23 DFAM Thesis or Dissertation http://hdl.handle.net/2433/158076 10.14989/doctor.k17064 eng application/pdf 京都大学 (Kyoto University) 京都大学
collection	NDLTD
language	English
format	Others
sources	NDLTD
topic	Fluorocarbon plasmas Inductively coupled plasma Plasma etching profile Charging 500
spellingShingle	Fluorocarbon plasmas Inductively coupled plasma Plasma etching profile Charging 500 Fukumoto, Hiroshi Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas
description	Kyoto University (京都大学) === 0048 === 新制・課程博士 === 博士(工学) === 甲第17064号 === 工博第3613号 === 新制\|\|工\|\|1548(附属図書館) === 29784 === 京都大学大学院工学研究科航空宇宙工学専攻 === (主査)教授斧髙一, 教授稲室隆二, 教授青木一生 === 学位規則第4条第1項該当
author2	斧, 髙一
author_facet	斧, 髙一 Fukumoto, Hiroshi
author	Fukumoto, Hiroshi
author_sort	Fukumoto, Hiroshi
title	Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas
title_short	Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas
title_full	Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas
title_fullStr	Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas
title_full_unstemmed	Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas
title_sort	model analysis of plasma-surface interactions during silicon oxide etching in fluorocarbon plasmas
publisher	京都大学 (Kyoto University)
publishDate	2012
url	http://hdl.handle.net/2433/158076
work_keys_str_mv	AT fukumotohiroshi modelanalysisofplasmasurfaceinteractionsduringsiliconoxideetchinginfluorocarbonplasmas AT fukumotohiroshi furuorokābonpurazumaniyorusuānhuàshirikonetchinguniokerupurazumabiǎomiànxiānghùzuòyòngnoshùzhíjiěxī
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Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas

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