Model Analysis of Plasma-Surface Interactions during Silicon Oxide Etching in Fluorocarbon Plasmas
Kyoto University (京都大学) === 0048 === 新制・課程博士 === 博士(工学) === 甲第17064号 === 工博第3613号 === 新制||工||1548(附属図書館) === 29784 === 京都大学大学院工学研究科航空宇宙工学専攻 === (主査)教授 斧 髙一, 教授 稲室 隆二, 教授 青木 一生 === 学位規則第4条第1項該当...
Main Author: | Fukumoto, Hiroshi |
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Other Authors: | 斧, 髙一 |
Format: | Others |
Language: | English |
Published: |
京都大学 (Kyoto University)
2012
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Subjects: | |
Online Access: | http://hdl.handle.net/2433/158076 |
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