A Study on Plasma Process-Induced Damage during Fabrication of Si Devices and Methodology for Optical Measurement
京都大学 === 0048 === 新制・課程博士 === 博士(工学) === 甲第17788号 === 工博第3767号 === 新制||工||1576(附属図書館) === 30595 === 京都大学大学院工学研究科航空宇宙工学専攻 === (主査)教授 斧 髙一, 教授 木村 健二, 教授 立花 明知 === 学位規則第4条第1項該当 === Doctor of Philosophy (Engineering) === Kyoto University === DFAM...
Main Author: | Matsuda, Asahiko |
---|---|
Other Authors: | 斧, 髙一 |
Format: | Doctoral Thesis |
Language: | English |
Published: |
京都大学 (Kyoto University)
2013
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Subjects: | |
Online Access: | http://hdl.handle.net/2433/179357 |
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