Elektronová litografie v řádkovacím elektronovém mikroskopu

Elektronová litografie v řádkovacím elektronovém mikroskopu

Electron beam lithography in a scanning electron microscope Tescan Miran LMH is described. Detailed parametres of preparation procedure of metal structures with characteristic dimensions below 100 nm were obtained. Additionally, a preparation of square arrays of sub 100-nm metal dots with 1 µm perio...

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Bibliographic Details
Main Author: Haviar, Stanislav
Other Authors: Lopour, Filip
Format: Dissertation
Language:Czech
Published: 2010
Online Access:http://www.nusl.cz/ntk/nusl-286220
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spelling ndltd-nusl.cz-oai-invenio.nusl.cz-2862202017-06-27T04:41:10Z Elektronová litografie v řádkovacím elektronovém mikroskopu Electron lithography in scanning electron microscope Lopour, Filip Haviar, Stanislav Matolín, Vladimír Electron beam lithography in a scanning electron microscope Tescan Miran LMH is described. Detailed parametres of preparation procedure of metal structures with characteristic dimensions below 100 nm were obtained. Additionally, a preparation of square arrays of sub 100-nm metal dots with 1 µm periode is being discussed. The lithography was performend with self-prepared resist layers (thickness < 25 nm), parameters of the spin-coating procedure are listed as well. A construction of a model single-wire sensor is described. The sensor had macroscopic gold contacts with thin (< 200 nm) tin oxide wires in between. The structures were investigated by means of scanning electron microscopy and atomic force microscopy. 2010 info:eu-repo/semantics/masterThesis http://www.nusl.cz/ntk/nusl-286220 cze info:eu-repo/semantics/restrictedAccess
collection NDLTD
language Czech
format Dissertation
sources NDLTD
description Electron beam lithography in a scanning electron microscope Tescan Miran LMH is described. Detailed parametres of preparation procedure of metal structures with characteristic dimensions below 100 nm were obtained. Additionally, a preparation of square arrays of sub 100-nm metal dots with 1 µm periode is being discussed. The lithography was performend with self-prepared resist layers (thickness < 25 nm), parameters of the spin-coating procedure are listed as well. A construction of a model single-wire sensor is described. The sensor had macroscopic gold contacts with thin (< 200 nm) tin oxide wires in between. The structures were investigated by means of scanning electron microscopy and atomic force microscopy.
author2 Lopour, Filip
author_facet Lopour, Filip
Haviar, Stanislav
author Haviar, Stanislav
spellingShingle Haviar, Stanislav
Elektronová litografie v řádkovacím elektronovém mikroskopu
author_sort Haviar, Stanislav
title Elektronová litografie v řádkovacím elektronovém mikroskopu
title_short Elektronová litografie v řádkovacím elektronovém mikroskopu
title_full Elektronová litografie v řádkovacím elektronovém mikroskopu
title_fullStr Elektronová litografie v řádkovacím elektronovém mikroskopu
title_full_unstemmed Elektronová litografie v řádkovacím elektronovém mikroskopu
title_sort elektronová litografie v řádkovacím elektronovém mikroskopu
publishDate 2010
url http://www.nusl.cz/ntk/nusl-286220
work_keys_str_mv AT haviarstanislav elektronovalitografievradkovacimelektronovemmikroskopu
AT haviarstanislav electronlithographyinscanningelectronmicroscope
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