Elektronová litografie v řádkovacím elektronovém mikroskopu
Electron beam lithography in a scanning electron microscope Tescan Miran LMH is described. Detailed parametres of preparation procedure of metal structures with characteristic dimensions below 100 nm were obtained. Additionally, a preparation of square arrays of sub 100-nm metal dots with 1 µm perio...
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| Format: | Dissertation |
| Language: | Czech |
| Published: |
2010
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| Online Access: | http://www.nusl.cz/ntk/nusl-286220 |