Tip-based nanofabrication below 40 nm combined with a nanopositioning machine with a movement range of Ø100 mm

• Main Authors: Dontsov, D. (Author), Hesse, S. (Author), Krötschl, A. (Author), Manske, E. (Author), Ortlepp, I. (Author), Rangelow, I.W (Author), Reibe, M. (Author), Reuter, C. (Author), Stauffenberg, J. (Author), Strehle, S. (Author)
• Format: Article
• Language: English
• Published: Elsevier B.V. 2023
• Subjects: Atomic force; Field emission; Field emission scanning; Field emission scanning probe lithography; Large working area; Large working areas; Micro-cantilevers; Nano-positioning; Nanopositioning technology; Nanotechnology; Scanning probe lithography; Tip-based nanofabrication; Working areas
• Online Access: View Fulltext in Publisher

 In this paper, the combination of an advanced nanopositioning technique and a tip-based system, which can be used as an atomic force microscope (AFM) and especially for field emission scanning probe lithography (FESPL) is presented. This is possible through the use of active microcantilevers that allow easy switching between measurement and write modes. The combination of nanopositioning and nanomeasuring machines and tip-based systems overcomes the usual limitations of AFM technology and makes it possible to perform high-precision surface scanning and nanofabrication on wafer sizes up to 4 in. We specifically discuss the potential of nanofabrication via FESPL in combination with the nanofabrication machine (NFM-100). Results are presented, where nanofabrication is demonstrated in form of a spiral path over a total length of 1 mm and the potential of this technique in terms of accuracy is discussed. Furthermore, ten lines were written with a pitch of 100 nm and a linewidth below 40 nm was achieved, which is in principle possible over the entire range of motion. © 2023 The Author(s)