Tip-based nanofabrication below 40 nm combined with a nanopositioning machine with a movement range of Ø100 mm

In this paper, the combination of an advanced nanopositioning technique and a tip-based system, which can be used as an atomic force microscope (AFM) and especially for field emission scanning probe lithography (FESPL) is presented. This is possible through the use of active microcantilevers that al...

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Bibliographic Details
Main Authors: Dontsov, D. (Author), Hesse, S. (Author), Krötschl, A. (Author), Manske, E. (Author), Ortlepp, I. (Author), Rangelow, I.W (Author), Reibe, M. (Author), Reuter, C. (Author), Stauffenberg, J. (Author), Strehle, S. (Author)
Format: Article
Language:English
Published: Elsevier B.V. 2023
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Online Access:View Fulltext in Publisher

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