Tip-based nanofabrication below 40 nm combined with a nanopositioning machine with a movement range of Ø100 mm
In this paper, the combination of an advanced nanopositioning technique and a tip-based system, which can be used as an atomic force microscope (AFM) and especially for field emission scanning probe lithography (FESPL) is presented. This is possible through the use of active microcantilevers that al...
Main Authors: | Dontsov, D. (Author), Hesse, S. (Author), Krötschl, A. (Author), Manske, E. (Author), Ortlepp, I. (Author), Rangelow, I.W (Author), Reibe, M. (Author), Reuter, C. (Author), Stauffenberg, J. (Author), Strehle, S. (Author) |
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Format: | Article |
Language: | English |
Published: |
Elsevier B.V.
2023
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Subjects: | |
Online Access: | View Fulltext in Publisher |
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