Enhanced magnetic properties of NiFe2O4thin films deposited on BCZT-buffered SrTiO3substrate

In this study, NiFe2O4 films were deposited on the Ba0.85Ca0.15Zr0.9Ti0.1O3 (BCZT)-buffered SrTiO3 substrate by pulsed laser deposition, and the effect of the thickness of the layer on the rearrangement of cations and magnetic property of the NiFe2O4 films was explored. All NiFe2O4 films were grown...

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Bibliographic Details
Main Authors: Liu, S. (Author), Shen, Q. (Author), Shi, J. (Author), Wang, C. (Author)
Format: Article
Language:English
Published: American Institute of Physics Inc. 2022
Subjects:
Online Access:View Fulltext in Publisher
LEADER 02055nam a2200409Ia 4500
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008 220425s2022 CNT 000 0 und d
020 |a 21583226 (ISSN) 
245 1 0 |a Enhanced magnetic properties of NiFe2O4thin films deposited on BCZT-buffered SrTiO3substrate 
260 0 |b American Institute of Physics Inc.  |c 2022 
856 |z View Fulltext in Publisher  |u https://doi.org/10.1063/5.0088002 
520 3 |a In this study, NiFe2O4 films were deposited on the Ba0.85Ca0.15Zr0.9Ti0.1O3 (BCZT)-buffered SrTiO3 substrate by pulsed laser deposition, and the effect of the thickness of the layer on the rearrangement of cations and magnetic property of the NiFe2O4 films was explored. All NiFe2O4 films were grown epitaxially along the c-axis orientation and exhibited a smooth surface. When the buffer layer was 30 nm thick, the proportion of Ni2+ cations at the Td site in NiFe2O4 reached the maximum. Accordingly, the obtained film exhibited the highest saturation magnetization of 113 emu/cm3. This work demonstrates that introducing the BCZT buffer layer between the NiFe2O4 thin film and the SrTiO3 substrate is an effective approach to tailor the magnetic properties of NiFe2O4 thin films. © 2022 Author(s). 
650 0 4 |a Barium compounds 
650 0 4 |a Buffer layers 
650 0 4 |a Calcium compounds 
650 0 4 |a C-axis orientations 
650 0 4 |a Effective approaches 
650 0 4 |a High-saturation magnetization 
650 0 4 |a Iron compounds 
650 0 4 |a Magnetic properties 
650 0 4 |a Nickel compounds 
650 0 4 |a Positive ions 
650 0 4 |a Pulsed laser deposition 
650 0 4 |a Pulsed-laser deposition 
650 0 4 |a Saturation magnetization 
650 0 4 |a Smooth surface 
650 0 4 |a SrTiO3 substrates 
650 0 4 |a Strontium titanates 
650 0 4 |a Thin films 
650 0 4 |a Thin-films 
650 0 4 |a Titanium compounds 
650 0 4 |a Zirconium compounds 
700 1 |a Liu, S.  |e author 
700 1 |a Shen, Q.  |e author 
700 1 |a Shi, J.  |e author 
700 1 |a Wang, C.  |e author 
773 |t AIP Advances