Local structural analysis of erbium-doped tellurite modified silica glass with x-ray photoelectron spectroscopy

Ultrafast laser plasma doping (ULPD) is a recently developed technique that enables the blending of femtosecond laser produced plasma from a TeO2 (target) based glass with a SiO2 (substrate) without or minimum phase separation to form a silicate glass. The background oxygen gas pressure plays a majo...

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Bibliographic Details
Main Authors: Ahmad Kamil, S. (Author), Chandrappan, J. (Author), Jose, G. (Author), Portoles, J. (Author), Steenson, P. (Author)
Format: Article
Language:English
Published: Institute of Physics Publishing 2019
Subjects:
Online Access:View Fulltext in Publisher
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LEADER 03344nam a2200601Ia 4500
001 10.1088-2053-1591-ab28eb
008 220121s2019 CNT 000 0 und d
020 |a 20531591 (ISSN) 
245 1 0 |a Local structural analysis of erbium-doped tellurite modified silica glass with x-ray photoelectron spectroscopy 
260 0 |b Institute of Physics Publishing  |c 2019 
650 0 4 |a Blending 
650 0 4 |a Device application 
650 0 4 |a Doped glass 
650 0 4 |a Er3+doped glasses 
650 0 4 |a Erbium compounds 
650 0 4 |a Experimental techniques 
650 0 4 |a Films 
650 0 4 |a Glass 
650 0 4 |a laser ablation 
650 0 4 |a Laser ablation 
650 0 4 |a Laser produced plasmas 
650 0 4 |a Metal nanoparticles 
650 0 4 |a Nanoparticle formation 
650 0 4 |a Non-bridging oxygen 
650 0 4 |a optical materials 
650 0 4 |a Optical materials 
650 0 4 |a Oxygen 
650 0 4 |a Oxygen gas pressure 
650 0 4 |a Phase separation 
650 0 4 |a Photoelectrons 
650 0 4 |a Photonic devices 
650 0 4 |a Photons 
650 0 4 |a Plasma interactions 
650 0 4 |a Preparation conditions 
650 0 4 |a Refractive index 
650 0 4 |a Semiconductor doping 
650 0 4 |a Silica 
650 0 4 |a Silicates 
650 0 4 |a Target materials 
650 0 4 |a Tellurium compounds 
650 0 4 |a ultrafast lasers 
650 0 4 |a Ultrafast lasers 
650 0 4 |a X ray photoelectron spectroscopy 
650 0 4 |a x-ray photoelectron spectroscopy 
856 |z View Fulltext in Publisher  |u https://doi.org/10.1088/2053-1591/ab28eb 
856 |z View in Scopus  |u https://www.scopus.com/inward/record.uri?eid=2-s2.0-85069713559&doi=10.1088%2f2053-1591%2fab28eb&partnerID=40&md5=917287e128082e5a72b9456985dcacd7 
520 3 |a Ultrafast laser plasma doping (ULPD) is a recently developed technique that enables the blending of femtosecond laser produced plasma from a TeO2 (target) based glass with a SiO2 (substrate) without or minimum phase separation to form a silicate glass. The background oxygen gas pressure plays a major role in ULPD as it directly impacts the plasma plume characteristics, resulting in lower erbium doped tellurite modified silica (EDTS) thickness and refractive index at higher process gas pressure. X-ray photoelectron spectroscopy (XPS) used in this study to analyse the formation of EDTS and local bonding environment of its constituents. This report confirms the presence of both target materials and SiO2 in the resulting EDTS films. XPS of O 1 s core, confirms that bridging oxygen (BO) is more dominant compared to non-bridging oxygen (NBO) in the EDTS glass network, and the amount of BO is more stand out for higher gas pressures when the glass modifiers are relatively smaller in concentration. Our study revealed the nucleation Te and Er to form metal nanoparticles in glass under certain preparation conditions/doping concentration which were previously undetected using other experimental techniques. It is important to control this nanoparticle formation in engineering EDTS for photonic device applications. © 2019 IOP Publishing Ltd. 
700 1 0 |a Ahmad Kamil, S.  |e author  
700 1 0 |a Chandrappan, J.  |e author  
700 1 0 |a Jose, G.  |e author  
700 1 0 |a Portoles, J.  |e author  
700 1 0 |a Steenson, P.  |e author  
773 |t Materials Research Express  |x 20531591 (ISSN)  |g 6 8