Electrodeposition of Ni-Si Schottky barriers

Electrodeposition of Ni-Si Schottky barriers

Electrodeposition is being used to fabricate magnetic microstructures directly on patterned n-type Si wafers of various substrate resistivities. The Ni-Si Schottky barrier is characterized and found to be of high quality for relatively low Si resistivities (1-2 Omega(.)cm), with extremely low revers...

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Main Authors: Kiziroglou, M.E (Author), Zhukov, A.A (Author), Abdelsalam, M. (Author), Li, X.L (Author), de Groot, P. (Author), Bartlett, P.N (Author), de Groot, C.H (Author)
Format: Article
Language:English
Published: 2005-10-01.
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