Total ionizing dose response of fluorine implanted silicon-on-insulator buried oxide
A comparison is made of the behavior of silicon on insulator buried oxides and wet thermal oxides before and after fluorine implantation and irradiation. Before irradiation, the electrical characteristics of the thermal oxide and buried oxide are significantly different. The fluorine implantation in...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2014-09.
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| Subjects: | |
| Online Access: | Get fulltext |