Ablated gratings on borosilicate glass by 193nm excimer laser radiation
Relief gratings of 500nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation using an excimer laser at a wavelength of 193nm and a modified Mach-Zehnder interferometer. The grating fabrication process has been quantified using diffraction efficiency measurement...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
1999-12.
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| Subjects: | |
| Online Access: | Get fulltext |
| Summary: | Relief gratings of 500nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation using an excimer laser at a wavelength of 193nm and a modified Mach-Zehnder interferometer. The grating fabrication process has been quantified using diffraction efficiency measurements and atomic force microscope microscans, and related to the incident energy density. |
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