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1“...博士 === 國立交通大學 === 材料科學與工程學系所 === 107 === Gallium nitride-based metal–insulator–semiconductor high...”
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2“... device applications owing to the high current, high breakdown, and low fabrication cost. This thesis...”
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3“... attentions in semiconductor industry. Its excellent properties, such as wide bandgap, high electron mobility...”
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4“... lot of research attentions in semiconductor industry. Owing to high current, high breakdown and low...”
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5“... gates have already been the trend of semiconductor industry. Many researches still focus on reducing...”
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6“...碩士 === 國立交通大學 === 光電系統研究所 === 105 === GaN-based devices are attractive candidates for high-power...”
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7“...-insulator-semiconductor (M-I-S) gate structures has shown marked improvements in reducing gate leakage...”
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8“..., comparing with other electron device. It is more suitable for high power application. However...”
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9“... gates have already been the trend of semiconductor industry. Many researches still focus on reducing...”
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10“... semiconductor (CMOS) downsizing has long been hindered by the unexpected interface quality between the high-k...”
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11“...-body (UTB) semiconductor of MoS2 can sufficiently increase gate-to-channel control and reduce current...”
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12“... contacts have been extensively re-examined and new approaches are proposed. The effect of the device layout...”
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13“...碩士 === 國立交通大學 === 光電系統研究所 === 106 === The complementary metal oxide semiconductor (CMOS) technology...”
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