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1“... Technique without any advanced lithography tool. The alternatively innovative process employs the advantage...”
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2“.... This work is devoted to the performance optimization of JLFETs with an advanced doping profile...”
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3“... effectively suppress short channel effect. In addition, the electron and hole mobility of Ge are three...”
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4“...碩士 === 國立交通大學 === 理學院應用科技學程 === 104 === Recently the booming of portable electronic products...”
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