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"Resist contrast"
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1
Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82
by
Th. Mpatzaka
,
G. Zisis
,
I. Raptis
,
V. Vamvakas
,
C. Kaiser
,
T. Mai
,
M. Schirmer
,
M. Gerngroß
,
G. Papageorgiou
Published 2020-08-01
Subjects:
“
...
Resist
contrast
...
”
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Article
2
Quantitative analysis and modeling of line edge roughness in near-field lithography: toward high pattern quality in nanofabrication
by
Han Dandan
,
Park Changhoon
,
Oh Seonghyeon
,
Jung Howon
,
Hahn Jae W.
Published 2019-04-01
Subjects:
“
...
resist
contrast
...
”
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Article
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2
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2
Author
C. Kaiser
1
G. Papageorgiou
1
G. Zisis
1
Hahn Jae W.
1
Han Dandan
1
I. Raptis
1
Jung Howon
1
M. Gerngroß
1
M. Schirmer
1
Oh Seonghyeon
1
Park Changhoon
1
T. Mai
1
Th. Mpatzaka
1
V. Vamvakas
1
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Language
English
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