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1“...博士 === 國立交通大學 === 電子研究所 === 99 === The semiconductor VLSI technology is so successful...”
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2“.... However, the problem of random process variability arises and become more serious along with semiconductor...”
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3“...2 interface of planar bulk metal -oxide-semiconductor field effect transistors (MOSFETs) and fin...”
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4“...碩士 === 國立交通大學 === 電子研究所 === 106 === In current semiconductor device process, the process...”
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5“...) is one of the important topics in semiconductor manufacturing, concerning the threshold voltage and drain...”
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6“...碩士 === 國立交通大學 === 電子工程學系 電子研究所 === 102 === With the technology generation down-scaling trend...”
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7“... polysilicon gate metal-oxide-semiconductor field-effect-transistor at different temperatures serves as a...”
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8“... into the technology generation of 22/20 nm and will keep developing newer and more efficient devices. We...”
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9“... metal-oxide-semiconductor field-effect transistors (MOSFETs), down-scaling has become a current trend...”
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