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Akihiro Oshima
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Akihiro Oshima
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Akihiro Oshima
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1
Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam
by
Tomoko Gowa Oyama
,
Akihiro
Oshima
,
Seiichi Tagawa
Published 2016-08-01
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Article
2
Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography
by
Tomoko Gowa Oyama
,
Akihiro
Oshima
,
Masakazu Washio
,
Seiichi Tagawa
Published 2011-12-01
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Article
3
Trapped radical behavior of electron beam irradiated polytetrafluoroethylene fine powder at various temperatures
by
Akihiro
Oshima
,
Hiroto Horiuchi
,
Atsushi Nakamura
,
Shun Kobayashi
,
Ayana Terui
,
Ayano Mino
,
Ryoya Shimura
,
Masakazu Washio
Published 2021-05-01
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