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Emmanuel Scheid
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A differential Hall effect measurement method with sub-nanometre resolution for active dopant concentration profiling in ultrathin doped Si1−xGex and Si layers
by
Richard Daubriac
,
Emmanuel
Scheid
,
Hiba Rizk
,
Richard Monflier
,
Sylvain Joblot
,
Rémi Beneyton
,
Pablo Acosta Alba
,
Sébastien Kerdilès
,
Filadelfo Cristiano
Published 2018-07-01
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