Widely wavelength-tunable ultrashort pulse generation using polarization maintaining optical fibers

by Nishizawa, Norihiko, Goto, Toshio
Published 2001

Compact system of wavelength-tunable femtosecond soliton pulse generation using optical fibers

by Nishizawa, Norihiko, Goto, Toshio
Published 1999

Generation and application of wavelength tunable ultrashort soliton pulse in optical fiber

by Nishizawa, Norihiko, Goto, Toshio
Published 2004

Ultrathin fluorinated silicon nitride gate dielectric films formed by remote plasma enhanced chemical vapor deposition employing NH_3 and SiF_4

by Ohta, Hiroyuki, Hori, Masaru, Goto, Toshio
Published 2001

Simultaneous generation of wavelength tunable two-colored femtosecond soliton pulses using optical fibers

by Nishizawa, Norihiko, Okamura, Ryuji, Goto, Toshio
Published 1999

Compact System of Wavelength Tunable Femtosecond Soliton Pulse Generation in 1.56-1.86μm using Optical Fiber

by Nishizawa, Norihiko, Okamura, Ryuji, Goto, Toshio
Published 1999

1.56-2.03 μm Widely Wavelength Tunable Femtosecond Soliton Pulse Generation Using Optical Fibers

by Nishizawa, Norihiko, Nagai, Hiroyuki, Goto, Toshio
Published 1999

0.78-0.90-μm wavelength-tunable femtosecond soliton pulse generation using photonic crystal fiber

by Nishizawa, Norihiko, Ito, Youta, Goto, Toshio
Published 2002

Properties of atmospheric pressure plasmas with microwave excitations for plasma processing

by Nagai, Mikio, Hori, Masaru, Goto, Toshio
Published 2005

Absolute density measurement of cyanogen fluoride in CHF_3/N_2 electron cyclotron resonance plasma using infrared diode laser absorption spectroscopy

by Miyata, Koji, Arai, Hiroyoshi, Hori, Masaru, Goto, Toshio
Published 1997

Novel process for SiO_2/Si selective etching using a novel gas source for preventing global warming

by Fujita, Kazushi, Ito, Masafumi, Hori, Masaru, Goto, Toshio
Published 1999

Control of seed layer for a low temperature formation of polycrystalline silicon with high crystallinity and a smooth surface

by Murata, Kazuya, Ito, Masafumi, Hori, Masaru, Goto, Toshio
Published 1999

Etching organic low dielectric film in ultrahigh frequency plasma using N_2/H_2 and N_2/NH_3 gases

by Nagai, Hisao, Hiramatsu, Mineo, Hori, Masaru, Goto, Toshio
Published 2003

Environmentally benign etching process of amorphous silicon and tungsten using species evaporated from polytetrafluoroethylene and fluorinated ethylene propylene

by Fujita, Kazushi, Hori, Masaru, Goto, Toshio, Ito, Masafumi
Published 2003

Silicon oxide contact hole etching employing an environmentally benign process

by Fujita, Kazushi, Hori, Masaru, Goto, Toshio, Ito, Masafumi
Published 2002

Measurement of oxygen atom density employing vacuum ultraviolet absorption spectroscopy with microdischarge hollow cathode lamp

by Nagai, Hisao, Hiramatsu, Mineo, Hori, Masaru, Goto, Toshio
Published 2003

Effect of ions and radicals on formation of silicon nitride gate dielectric films using plasma chemical vapor deposition

by Ohta, Hiroyuki, Nagashima, Atsushi, Hori, Masaru, Goto, Toshio
Published 2001

Spatial distribution of the absolute densities of CF_x radicals in fluorocarbon plasmas determined from single-path infrared laser absorption and laser-induced fluorescence

by Nakamura, Masayuki, Hori, Masaru, Goto, Toshio, Ito, Masafumi, Ishii, Nobuo
Published 2001

Surface reaction of CF_2 radicals for fluorocarbon film formation in SiO_2/Si selective etching process

by Inayoshi, Muneto, Ito, Masafumi, Hori, Masaru, Goto, Toshio, Hiramatsu, Mineo
Published 1998

Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation

by Inayoshi, Muneto, Ito, Masafumi, Hori, Masaru, Goto, Toshio, Hiramatsu, Mineo
Published 1999