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Kazuo Kuriyama
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Fully Ion Implanted Normally-Off GaN DMOSFETs with ALD-Al<sub>2</sub>O<sub>3</sub> Gate Dielectrics
by
Michitaka Yoshino
,
Yuto Ando
,
Manato Deki
,
Toru Toyabe
,
Kazuo
Kuriyama
,
Yoshio Honda
,
Tomoaki Nishimura
,
Hiroshi Amano
,
Tetsu Kachi
,
Tohru Nakamura
Published 2019-02-01
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