Suppressing Oxidation-Enhanced Diffusion of Boron in Silicon With Oxygen-Inserted Layers

by Daniel Connelly, Richard Burton, Nyles W. Cody, Pavel Fastenko, Marek Hytha, Robert Stephenson, Hideki Takeuchi, Keith Doran Weeks, Robert Mears
Published 2018-01-01

Punch-Through Stop Doping Profile Control via Interstitial Trapping by Oxygen-Insertion Silicon Channel

by Hideki Takeuchi, Robert J. Mears, Robert J. Stephenson, Marek Hytha, Daniel Connelly, Pavel Fastenko, Richard Burton, Nyles W. Cody, Doran Weeks, Dmitri Choutov, Nidhi Agrawal, Suman Datta
Published 2018-01-01