Super fine cerium hydroxide abrasives for SiO2 film chemical mechanical planarization performing scratch free

by Young-Hye Son, Gi-Ppeum Jeong, Pil-Su Kim, Man-Hyup Han, Seong-Wan Hong, Jae-Young Bae, Sung-In Kim, Jin-Hyung Park, Jea-Gun Park
Published 2021-09-01