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Toshiyuki Kawaharamura
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Toshiyuki Kawaharamura
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Toshiyuki Kawaharamura
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1
Growth and electrical properties of AlOx grown by mist chemical vapor deposition
by
Toshiyuki
Kawaharamura
,
Takayuki Uchida
,
Masaru Sanada
,
Mamoru Furuta
Published 2013-03-01
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Article
2
Conductive Si-doped α-(AlxGa1−x)2O3 thin films with the bandgaps up to 6.22 eV
by
Giang T. Dang
,
Yuki Tagashira
,
Tatsuya Yasuoka
,
Li Liu
,
Toshiyuki
Kawaharamura
Published 2020-11-01
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Article
3
α-(AlxGa1−x)2O3 single-layer and heterostructure buffers for the growth of conductive Sn-doped α-Ga2O3 thin films via mist chemical vapor deposition
by
Giang T. Dang
,
Shota Sato
,
Yuki Tagashira
,
Tatsuya Yasuoka
,
Li Liu
,
Toshiyuki
Kawaharamura
Published 2020-10-01
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Article
4
The effect of HCl on the α-Ga2O3 thin films fabricated by third generation mist chemical vapor deposition
by
Tatsuya Yasuoka
,
Li Liu
,
Tamako Ozaki
,
Kanta Asako
,
Yuna Ishikawa
,
Miyabi Fukue
,
Giang T. Dang
,
Toshiyuki
Kawaharamura
Published 2021-04-01
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Article
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