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Wakabayashi, H.
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Wakabayashi, H.
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Conformal deposition of WS2 layered film by low-temperature metal-organic chemical vapor deposition
by
Cho, K.
,
Ishikawa, M.
,
Machida, H.
,
Ogura, A.
,
Sawamoto, N.
,
Sudoh, H.
,
Wakabayashi
,
H
.
,
Yokogawa, R.
Published 2023
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Related Subjects
Channel layers
Channel materials
Conformal deposition
High potential
Layered films
Low-temperature deposition
Lows-temperatures
MOCVD
MOSFETs
Metal-organic chemical vapour depositions
Metallorganic chemical vapor deposition
Multi-layers
Organic chemicals
Organometallics
Temperature
Tungsten compounds
WS2
low temperature deposition
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