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Yefeng Xu
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Yefeng Xu
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pMOSFETs Featuring ALD W Filling Metal Using SiH4 and B2H6 Precursors in 22 nm Node CMOS Technology
by
Guilei Wang
,
Jun Luo
,
Jinbiao Liu
,
Tao Yang
,
Yefeng
Xu
,
Junfeng Li
,
Huaxiang Yin
,
Jiang Yan
,
Huilong Zhu
,
Chao Zhao
,
Tianchun Ye
,
Henry H. Radamson
Published 2017-04-01
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