A novel fabrication technique for three-dimensional concave nanolens arrays

A novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to...

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Bibliographic Details
Main Authors: Tianli Duan, Kang Xu, Zhihong Liu, Chenjie Gu, Jisheng Pan, Diing Shenp Ang, Rui Zhang, Yao Wang, Xuhang Ma
Format: Article
Language:English
Published: Elsevier 2020-09-01
Series:Journal of Materiomics
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S235284782030023X