Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition

Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition

Most thin-film techniques require a multiple vacuum process, and cannot produce high-coverage continuous thin films with the thickness of a few nanometers on rough surfaces. We present a new ”paradigm shift” non-vacuum process to deposit high-quality, ultra-thin, single-crystal layers of coalesced s...

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Bibliographic Details
Main Authors: Yu-Kuang Liao, Yung-Tsung Liu, Dan-Hua Hsieh, Tien-Lin Shen, Ming-Yang Hsieh, An-Jye Tzou, Shih-Chen Chen, Yu-Lin Tsai, Wei-Sheng Lin, Sheng-Wen Chan, Yen-Ping Shen, Shun-Jen Cheng, Chyong-Hua Chen, Kaung-Hsiung Wu, Hao-Ming Chen, Shou-Yi Kuo, Martin D. B. Charlton, Tung-Po Hsieh, Hao-Chung Kuo
Format: Article
Language:English
Published: MDPI AG 2017-04-01
Series:Nanomaterials
Subjects:
nanoparticles
thin-film deposition
chemical bath deposition
thermolysis
atomic layer deposition
Online Access:http://www.mdpi.com/2079-4991/7/4/78

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http://www.mdpi.com/2079-4991/7/4/78

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