Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

Abstract In this work, we present our results about the thermal crystallization of ion beam sputtered hafnia on 0001 SiO2 substrates and its effect on the laser-induced damage threshold (LIDT). The crystallization process was studied using in-situ X-ray diffractometry. We determined an activation en...

Full description

Bibliographic Details
Main Authors: Zoltán Balogh-Michels, Igor Stevanovic, Aurelio Borzi, Andreas Bächli, Daniel Schachtler, Thomas Gischkat, Antonia Neels, Alexander Stuck, Roelene Botha
Format: Article
Language:English
Published: SpringerOpen 2021-03-01
Series:Journal of the European Optical Society-Rapid Publications
Subjects:
Hafnia
Grain growth
Crystallization
Thin films
X-ray diffraction
Laser-induced damage threshold
Online Access:https://doi.org/10.1186/s41476-021-00147-w

Internet

https://doi.org/10.1186/s41476-021-00147-w

Similar Items