Tuning the Electrical Properties of NiO Thin Films by Stoichiometry and Microstructure

Tuning the Electrical Properties of NiO Thin Films by Stoichiometry and Microstructure

Here, the electrical properties of NiO thin films grown on glass and Al<sub>2</sub>O<sub>3</sub> (0001) substrates have been investigated. It was found that the resistivity of NiO thin films strongly depends on oxygen stoichiometry. Nearly perfect stoichiometry yields extreme...

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Bibliographic Details
Main Authors: Yu-He Liu, Xiao-Yan Liu, Hui Sun, Bo Dai, Peng Zhang, Yong Wang
Format: Article
Language:English
Published: MDPI AG 2021-06-01
Series:Coatings
Subjects:
nickel oxide thin films
electrical properties
stoichiometry
energy loss near edge structure
microstructure
defect
Online Access:https://www.mdpi.com/2079-6412/11/6/697

Internet

https://www.mdpi.com/2079-6412/11/6/697

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