Study of the influence of ozone-air mixture supply conditions on the process of the photoresist removal from the silicon wafer surface
The study is devoted to the research of the dependence of the processing results of photoresistive films on the silicon wafers surface in an ozone environment on the conditions and parameters of the process. The high oxidizing potential of ozone justifies the possibility of its use for removing orga...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | Russian |
| Published: |
Educational institution «Belarusian State University of Informatics and Radioelectronics»
2020-10-01
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| Series: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| Subjects: | |
| Online Access: | https://doklady.bsuir.by/jour/article/view/2786 |