Volume Hologram Formation in SU-8 Photoresist
In order to further understand the mechanism of volume hologram formation in photosensitive polymers, light-induced material response is analyzed in commonly used epoxy-based negative photoresist Epon SU-8. For this purpose, time-resolved investigation of volume holographic grating growth is perform...
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| Format: | Article |
| Language: | English |
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MDPI AG
2017-05-01
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| Series: | Polymers |
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| Online Access: | http://www.mdpi.com/2073-4360/9/6/198 |