Monolayer colloidal lithography protocol: theoretical assessment and applicative potentialities for metal nanohole fabrication

Monolayer colloidal lithography protocol: theoretical assessment and applicative potentialities for metal nanohole fabrication

Polystyrene colloids adsorbed onto a poly(diallyldimethylammonium chloride) (PDDA) monolayer is the model-system exploited to present and discuss both theoretical assessment and extended practical roadmap of the monolayer colloidal lithography (MNL-CL) protocol, recently developed by the authors to...

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Bibliographic Details
Main Authors: Maura Cesaria, Antonietta Taurino, Maria Grazia Manera, Simona Scarano, Maria Minunni, Roberto Rella
Format: Article
Language:English
Published: Elsevier 2021-09-01
Series:Applied Surface Science Advances
Subjects:
Monolayer colloidal lithography protocol
Threshold interparticle-spacing model
Autocorrelation analysis
Salt-related degraded ordering
Refractive index sensing
Online Access:http://www.sciencedirect.com/science/article/pii/S266652392100043X

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http://www.sciencedirect.com/science/article/pii/S266652392100043X

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