Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films
The authors have deposited the diamond-like carbon (DLC) films by radio frequency inductively coupled plasma enhanced chemical vapor deposition (RF ICP PECVD) method. The investigated DLC films with different sp3 fraction content were deposited on polished and textured silicon substrates. The sp3 fr...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Sciendo
2018-05-01
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| Series: | Materials Science-Poland |
| Subjects: | |
| Online Access: | http://www.degruyter.com/view/j/msp.2018.36.issue-1/msp-2017-0119/msp-2017-0119.xml?format=INT |