Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization
Source and mask joint optimization (SMO) is a widely used computational lithography method for state-of-the-art optical lithography process to improve the yield of semiconductor wafers. Nowadays, computational efficiency has become one of the most challenging issues for the development of pixelated...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
JommPublish
2018-12-01
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| Series: | Journal of Microelectronic Manufacturing |
| Subjects: | |
| Online Access: | http://www.jommpublish.org/p/18/ |