Diagonal Symmetric Pattern-Based Illumination Invariant Measure for Severe Illumination Variation Face Recognition
The center symmetric pattern (CSP) was widely used in the local binary pattern based facial feature, whereas never used to develop the illumination invariant measure in the literature. This paper proposes a novel diagonal symmetric pattern (DSP) to develop the illumination invariant measure for seve...
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2020-01-01
|
| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9049393/ |