Rapid thermal annealing and crystallization mechanisms study of silicon nanocrystal in silicon carbide matrix

<p>Abstract</p> <p>In this paper, a positive effect of rapid thermal annealing (RTA) technique has been researched and compared with conventional furnace annealing for Si nanocrystalline in silicon carbide (SiC) matrix system. Amorphous Si-rich SiC layer has been deposited by co-sp...

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Bibliographic Details
Main Authors: Wan Zhenyu, Huang Shujuan, Green Martin, Conibeer Gavin
Format: Article
Language:English
Published: SpringerOpen 2011-01-01
Series:Nanoscale Research Letters
Online Access:http://www.nanoscalereslett.com/content/6/1/129