Atomic Layer Deposition (ALD) of Alumina over Activated Carbon Electrodes Enabling a Stable 4 V Supercapacitor Operation

Atomic Layer Deposition (ALD) of Alumina over Activated Carbon Electrodes Enabling a Stable 4 V Supercapacitor Operation

Abstract Designing high voltage (>3 V) and stable electrochemical supercapacitors with low self‐discharge is desirable for the applications in modern electronic devices. This work demonstrates a 4 V symmetric supercapacitor with stabilized cycling performance through atomic layer deposition (ALD)...

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Bibliographic Details
Main Authors: Dayakar Gandla, Guanghui Song, Chongrui Wu, Prof. Yair Ein‐Eli, Prof. Daniel Q. Tan
Format: Article
Language:English
Published: Wiley-VCH 2021-04-01
Series:ChemistryOpen
Subjects:
atomic layer deposition
supercapacitors
activated carbon
high voltage
self-discharge
Online Access:https://doi.org/10.1002/open.202000352

Internet

https://doi.org/10.1002/open.202000352

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