Influence of Rapid Thermal Annealing on the Characteristics of InGaN/GaN MQWs

• Main Authors: Tian Yuan, Liang Limin, Xie Xinjian, Liu Hui, Hao Qiuyan, Liu Caichi
• Format: Article
• Language: English
• Published: EDP Sciences 2016-01-01
• Series: MATEC Web of Conferences
• Subjects: InGaN/GaN MQWs; RTA; XRD; PL spectrum
• Online Access: http://dx.doi.org/10.1051/matecconf/20166706046

N-type InGaN/GaN multiple-quantum-wells (MQWs) were grown on sapphire substrates by metal organic chemical vapor deposition (MOCVD). The crystal quality and optical properties of samples after rapid thermal annealing (RTA) at different temperatures in a range from 400 to 800°C are investigated by X-ray diffraction (XRD) and photoluminescence (PL) spectrum. The experimental results show that the peaks of InGaN, InN and In can be observed in all samples. And the results are induced by the phase separation and In-clusters. The luminescence peak of the samples annealed showed a red shift. It is caused by strain stress relaxation during the RTA process. Furthermore, some defects can be eliminated and the best annealing temperature is from 500°C to 700°C.