Atomic Layer Deposition on Porous Materials: Problems with Conventional Approaches to Catalyst and Fuel Cell Electrode Preparation

Atomic Layer Deposition on Porous Materials: Problems with Conventional Approaches to Catalyst and Fuel Cell Electrode Preparation

Atomic layer deposition (ALD) offers exciting possibilities for controlling the structure and composition of surfaces on the atomic scale in heterogeneous catalysts and solid oxide fuel cell (SOFC) electrodes. However, while ALD procedures and equipment are well developed for applications involving...

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Bibliographic Details
Main Authors: Tzia Ming Onn, Rainer Küngas, Paolo Fornasiero, Kevin Huang, Raymond J. Gorte
Format: Article
Language:English
Published: MDPI AG 2018-03-01
Series:Inorganics
Subjects:
atomic layer deposition
heterogeneous catalysts
SOFC
thin films
diffusion limitations
vapor-solid reaction
ceria
perovskites
Online Access:http://www.mdpi.com/2304-6740/6/1/34

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http://www.mdpi.com/2304-6740/6/1/34

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