Physical-topology modeling of silicon/gallium arsenide Schottky transistor of submicron technology LSI

In this paper described researched essentials and physical mechanisms of MESFET on epitaxy layers of GaAs with monocrystalline silicon wafer. Conducted computer modeling of MESFET with p-channel: distributions of potential, volumetric charge, current in channel and its characteristics. Based on cond...

Full description

Bibliographic Details
Main Authors: S. P. Novosyadliy, V. M. Lukovkin, R. Melnyk, A. V. Pavlyshyn
Format: Article
Language:English
Published: Vasyl Stefanyk Precarpathian National University 2020-06-01
Series:Фізика і хімія твердого тіла
Subjects:
lsi
Online Access:https://journals.pnu.edu.ua/index.php/pcss/article/view/3014