Fabrication, Characterization and Simulation of Sputtered Pt/In-Ga-Zn-O Schottky Diodes for Low-Frequency Half-Wave Rectifier Circuits
Amorphous In-Ga-Zn-O (IGZO) is a high-mobility semiconductor employed in modern thin-film transistors for displays and it is considered as a promising material for Schottky diode-based rectifiers. Properties of the electronic components based on IGZO strongly depend on the manufacturing parameters s...
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doaj-155d5567667543779c9bef95b9e298782021-03-30T02:26:21ZengIEEEIEEE Access2169-35362020-01-01811178311179010.1109/ACCESS.2020.30022679116972Fabrication, Characterization and Simulation of Sputtered Pt/In-Ga-Zn-O Schottky Diodes for Low-Frequency Half-Wave Rectifier CircuitsVeronika Ulianova0https://orcid.org/0000-0002-8334-2756Farhan Rasheed1Sami Bolat2Galo Torres Sevilla3Yurii Didenko4https://orcid.org/0000-0001-7305-8519Xiaowei Feng5Ivan Shorubalko6Dominik Bachmann7Dmytro Tatarchuk8https://orcid.org/0000-0003-1171-6701Mehdi B. Tahoori9Jasmin Aghassi-Hagmann10Yaroslav E. Romanyuk11Laboratory for Thin Films and Photovoltaics, Empa–Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandChair of Dependable Nano Computing, Karlsruhe Institute of Technology, Karlsruhe, GermanyLaboratory for Thin Films and Photovoltaics, Empa–Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandLaboratory for Thin Films and Photovoltaics, Empa–Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandDepartment of Microelectronics, National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute”, Kyiv, UkraineInstitute of Nanotechnology, Karlsruhe Institute of Technology, Karlsruhe, GermanyTransport at Nanoscale Interfaces Laboratory, Empa–Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandTransport at Nanoscale Interfaces Laboratory, Empa–Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandDepartment of Microelectronics, National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute”, Kyiv, UkraineChair of Dependable Nano Computing, Karlsruhe Institute of Technology, Karlsruhe, GermanyInstitute of Nanotechnology, Karlsruhe Institute of Technology, Karlsruhe, GermanyLaboratory for Thin Films and Photovoltaics, Empa–Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandAmorphous In-Ga-Zn-O (IGZO) is a high-mobility semiconductor employed in modern thin-film transistors for displays and it is considered as a promising material for Schottky diode-based rectifiers. Properties of the electronic components based on IGZO strongly depend on the manufacturing parameters such as the oxygen partial pressure during IGZO sputtering and post-deposition thermal annealing. In this study, we investigate the combined effect of sputtering conditions of amorphous IGZO (In:Ga:Zn=1:1:1) and post-deposition thermal annealing on the properties of vertical thin-film Pt-IGZO-Cu Schottky diodes, and evaluated the applicability of the fabricated Schottky diodes for low-frequency half-wave rectifier circuits. The change of the oxygen content in the gas mixture from 1.64% to 6.25%, and post-deposition annealing is shown to increase the current rectification ratio from 10<sup>5</sup> to 10<sup>7</sup> at ±1 V, Schottky barrier height from 0.64 eV to 0.75 eV, and the ideality factor from 1.11 to 1.39. Half-wave rectifier circuits based on the fabricated Schottky diodes were simulated using parameters extracted from measured current-voltage and capacitance-voltage characteristics. The half-wave rectifier circuits were realized at 100 kHz and 300 kHz on as-fabricated Schottky diodes with active area of 200 μm × 200 μm, which is relevant for the near-field communication (125 kHz - 134 kHz), and provided the output voltage amplitude of 0.87 V for 2 V supply voltage. The simulation results matched with the measurement data, verifying the model accuracy for circuit level simulation.https://ieeexplore.ieee.org/document/9116972/Amorphous In-Ga-Zn-Ocapacitance-voltage characteristicscurrent-voltage characteristicshalf-wave rectifiersSchottky diodessputtering |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Veronika Ulianova Farhan Rasheed Sami Bolat Galo Torres Sevilla Yurii Didenko Xiaowei Feng Ivan Shorubalko Dominik Bachmann Dmytro Tatarchuk Mehdi B. Tahoori Jasmin Aghassi-Hagmann Yaroslav E. Romanyuk |
spellingShingle |
Veronika Ulianova Farhan Rasheed Sami Bolat Galo Torres Sevilla Yurii Didenko Xiaowei Feng Ivan Shorubalko Dominik Bachmann Dmytro Tatarchuk Mehdi B. Tahoori Jasmin Aghassi-Hagmann Yaroslav E. Romanyuk Fabrication, Characterization and Simulation of Sputtered Pt/In-Ga-Zn-O Schottky Diodes for Low-Frequency Half-Wave Rectifier Circuits IEEE Access Amorphous In-Ga-Zn-O capacitance-voltage characteristics current-voltage characteristics half-wave rectifiers Schottky diodes sputtering |
author_facet |
Veronika Ulianova Farhan Rasheed Sami Bolat Galo Torres Sevilla Yurii Didenko Xiaowei Feng Ivan Shorubalko Dominik Bachmann Dmytro Tatarchuk Mehdi B. Tahoori Jasmin Aghassi-Hagmann Yaroslav E. Romanyuk |
author_sort |
Veronika Ulianova |
title |
Fabrication, Characterization and Simulation of Sputtered Pt/In-Ga-Zn-O Schottky Diodes for Low-Frequency Half-Wave Rectifier Circuits |
title_short |
Fabrication, Characterization and Simulation of Sputtered Pt/In-Ga-Zn-O Schottky Diodes for Low-Frequency Half-Wave Rectifier Circuits |
title_full |
Fabrication, Characterization and Simulation of Sputtered Pt/In-Ga-Zn-O Schottky Diodes for Low-Frequency Half-Wave Rectifier Circuits |
title_fullStr |
Fabrication, Characterization and Simulation of Sputtered Pt/In-Ga-Zn-O Schottky Diodes for Low-Frequency Half-Wave Rectifier Circuits |
title_full_unstemmed |
Fabrication, Characterization and Simulation of Sputtered Pt/In-Ga-Zn-O Schottky Diodes for Low-Frequency Half-Wave Rectifier Circuits |
title_sort |
fabrication, characterization and simulation of sputtered pt/in-ga-zn-o schottky diodes for low-frequency half-wave rectifier circuits |
publisher |
IEEE |
series |
IEEE Access |
issn |
2169-3536 |
publishDate |
2020-01-01 |
description |
Amorphous In-Ga-Zn-O (IGZO) is a high-mobility semiconductor employed in modern thin-film transistors for displays and it is considered as a promising material for Schottky diode-based rectifiers. Properties of the electronic components based on IGZO strongly depend on the manufacturing parameters such as the oxygen partial pressure during IGZO sputtering and post-deposition thermal annealing. In this study, we investigate the combined effect of sputtering conditions of amorphous IGZO (In:Ga:Zn=1:1:1) and post-deposition thermal annealing on the properties of vertical thin-film Pt-IGZO-Cu Schottky diodes, and evaluated the applicability of the fabricated Schottky diodes for low-frequency half-wave rectifier circuits. The change of the oxygen content in the gas mixture from 1.64% to 6.25%, and post-deposition annealing is shown to increase the current rectification ratio from 10<sup>5</sup> to 10<sup>7</sup> at ±1 V, Schottky barrier height from 0.64 eV to 0.75 eV, and the ideality factor from 1.11 to 1.39. Half-wave rectifier circuits based on the fabricated Schottky diodes were simulated using parameters extracted from measured current-voltage and capacitance-voltage characteristics. The half-wave rectifier circuits were realized at 100 kHz and 300 kHz on as-fabricated Schottky diodes with active area of 200 μm × 200 μm, which is relevant for the near-field communication (125 kHz - 134 kHz), and provided the output voltage amplitude of 0.87 V for 2 V supply voltage. The simulation results matched with the measurement data, verifying the model accuracy for circuit level simulation. |
topic |
Amorphous In-Ga-Zn-O capacitance-voltage characteristics current-voltage characteristics half-wave rectifiers Schottky diodes sputtering |
url |
https://ieeexplore.ieee.org/document/9116972/ |
work_keys_str_mv |
AT veronikaulianova fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT farhanrasheed fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT samibolat fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT galotorressevilla fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT yuriididenko fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT xiaoweifeng fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT ivanshorubalko fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT dominikbachmann fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT dmytrotatarchuk fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT mehdibtahoori fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT jasminaghassihagmann fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits AT yaroslaveromanyuk fabricationcharacterizationandsimulationofsputteredptingaznoschottkydiodesforlowfrequencyhalfwaverectifiercircuits |
_version_ |
1724185151854870528 |