Near-field sub-diffraction photolithography with an elastomeric photomask

Near-field sub-diffraction photolithography with an elastomeric photomask

Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a co...

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Bibliographic Details
Main Authors: Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang-Yong Jeong, I Sak Lee, Jekwan Lee, Hongjae Moon, Jaejun Lee, Kiseok Chang, Su Seok Choi, Jeongmin Moon, Soonshin Jung, Shinill Kang, Wooyoung Lee, Heon-Jin Choi, Hyunyong Choi, Hyun Jae Kim, Jae-Hyun Lee, Jinwoo Cheon, Miso Kim, Jaemin Myoung, Hong-Gyu Park, Wooyoung Shim
Format: Article
Language:English
Published: Nature Publishing Group 2020-02-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-020-14439-1

Internet

https://doi.org/10.1038/s41467-020-14439-1

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